PLASMA CHEMISTRY AND PLASMA PROCESSING
PLASMA CHEMISTRY AND PLASMA PROCESSING
期刊ISSN: 0272-4324
E-ISSN: 1572-8986
影响因子: 登录后查看数据
自引率: 12%
SCI期刊JCR分区
SCI期刊JCR分区等级:2区
按学科分区
ENGINEERING, CHEMICAL
Q3
PHYSICS, APPLIED
Q3
PHYSICS, FLUIDS & PLASMAS
Q2
ENGINEERING, CHEMICAL
Q2
PHYSICS, APPLIED
Q2
PHYSICS, FLUIDS & PLASMAS
Q2
《新锐期刊分区表》(2026年3月发布)
大类学科
物理
3区
小类学科
工程:化工
3区
物理:应用
3区
物理:流体与等离子体
3区
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综述期刊
最新中科院SCI期刊分区(2025年3月升级版)
大类学科
物理与天体物理
3区
小类学科
工程:化工
3区
物理:应用
3区
物理:流体与等离子体
3区
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综述期刊
期刊简介
Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
出版信息
出版商
Springer US
涉及的研究方向
工程技术-工程:化工
刊期
Quarterly
年文章数
95
出版国家或地区
UNITED STATES
是否OA
Cite Score(2025年最新版)
Cite Score SJR SNIP 排名
5.1 0.462 0.854
学科
大类学科:Physics and Astronomy
小类学科:Condensed Matter Physics
分区
Q2
学科
大类学科:Physics and Astronomy
小类学科:General Chemical Engineering
分区
Q2
学科
大类学科:Physics and Astronomy
小类学科:General Chemistry
分区
Q2
学科
大类学科:Physics and Astronomy
小类学科:Surfaces, Coatings and Films
分区
Q2
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